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2. [Article] Cryogenic thin-film electron emitters
Thin‐film electron emitters are described, which operate below 200°K and below a limiting critical applied voltage (νc) in a stable temperature‐independent regime. Current‐voltage characteristics and normal ...Citation -
3. [Article] Growth, characterizations and applications of copper sulfide thin films by solution-based processes
Copper sulfides (Cu[subscript x]S) are compound semiconductor materials that exhibit considerable optical and electrical properties varying significantly as a function of the composition. Copper sulfide ...Citation -
4. [Article] A study of ZnS:Mn electroluminescent phosphors grown by halide transport chemical vapor deposition
A low pressure halide transport chemical vapor deposition (HTCVD) system to grow ZnS:Mn electroluminescent phosphors is characterized. Reactor parameters such as gas composition, gas flow rate, and source ...Citation -
5. [Article] Refractory Amorphous Metal Thin Films
Amorphous metal thin films lack the grain boundaries and dislocations present in crystalline metal films. As a result, amorphous metal films can be more mechanically robust, atomically smooth, and more ...Citation -
Microscale continuous thin films or patterned conductive structures find applications in thin film electronics, energy generation and functional sensor systems. An emerging alternative to conventional ...
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Advances in energy technologies and electronics have typically occurred through either heightened performance or cost reduction. This dissertation explores both routes through a series of fundamental material ...
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Polylactic acid (PLA), a renewable material, is used widely in a variety of commercial and specialty applications. However, certain limitations such as high temperature stability and brittleness limit ...
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The general emphasis of this work has been synthesis, characterization, and applications of n- and p-type inorganic oxide thin films that are deposited from solutions. In particular, a study of n-type ...
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10. [Article] Continuous Microreactor-Assisted Solution Deposition for Scalable Production of CdS Films
This is the publisher’s final pdf. The published article is copyrighted by The Electrochemical Society and can be found at: http://www.electrochem.org/.Citation